Tilted Fluctuation Electron Microscopy Data for Simulated and Deposited Amorphous Tantalum

University of California, Berkeley researchers provide fluctuation electron microscopy data for comparing analysis methods on amorphous tantalum. The dataset includes raw scanning nanodiffraction data and mean CBED pattern images for both simulated and sputter-deposited 8 nm-thick Ta samples, tilted between 0 and 45 degrees. Simulated data was generated using Prismatic STEM software, while experimental data was collected on a TitanX microscope at 200 kV.

Use Cases

• Benchmarking FEM analysis algorithms based on raw scanning nanodiffraction data from tilted samples.
• Comparing simulated and experimental FEM patterns for amorphous tantalum structures.
• Training or validating models for amorphous material characterization using the provided mean CBED pattern images.
• Studying the effect of sample tilt on electron microscopy data for amorphous thin films.

Strengths

• Includes both simulated and experimental data for direct comparison of analysis methods.
• Samples were tilted between 0 and 45 degrees in 15-degree increments, providing a structured variation.
• Provides raw data in .dm4 format and atomic coordinates in .xyz format, supporting detailed analysis.

Limitations

• Column-level documentation is absent; field semantics must be inferred after download.
• Row count and total dataset size are unknown, which may limit suitability assessment.
• Last update date is unknown; freshness unverified.

Provenance

Source

University of California, Berkeley

Collection Method

Experimental data collected via scanning nanodiffraction on a TitanX microscope; simulated data generated using Prismatic STEM software.