Thermophysical Properties of Semiconductor Process Gases

1999 data from the Semiconductor Industry Association's ITRS roadmap identifies a need for transport and thermal constants. This database provides measured properties, including heat capacity, thermal conductivity, viscosity, and virial coefficients, for gases used in chemical vapor deposition and mass flow controller calibration. The data supports equipment modeling and calibration research.

Use Cases

• Model chemical vapor deposition (CVD) equipment performance using heat capacity and thermal conductivity data for process gases.
• Calibrate mass flow controllers (MFCs) using viscosity and virial coefficient data for binary mixtures of process and carrier gases.
• Validate thermodynamic models with pressure-density-temperature relations derived from the virial equation of state coefficients.
• Analyze transport properties like thermal conductivity and viscosity for surrogate gases used in semiconductor manufacturing.

Strengths

• Data generated by the National Institute of Standards and Technology (NIST), a recognized standards authority.
• Covers multiple critical thermophysical properties: heat capacity, thermal conductivity, viscosity, and virial coefficients.
• Addresses a specific need identified in the 1999 Semiconductor Industry Association International Technology Roadmap.

Limitations

• Data is based on a 1999 industry roadmap and may not reflect the latest process gases or materials.
• The underlying measurement methodology and sample sizes for each gas are not detailed.
• Available only in HTML format, which may complicate programmatic data extraction and analysis.

Provenance

Source

National Institute of Standards and Technology

Collection Method

NIST measurements of thermophysical properties for process gases, surrogate gases, and their binary mixtures.

Time Range

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Freshness

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Geography

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